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(Steps Shown) The standard deviation of critical dimension thickness in semiconductor manufacturing is σ =20nm State the null and alternative hypothesis

Question: The standard deviation of critical dimension thickness in semiconductor manufacturing is \(\sigma =20nm\)

  1. State the null and alternative hypothesis used to demonstrate that the standard deviation is reduced.
  2. Assume that the previous test does not reject the null hypothesis. Does this result provide strong evidence that the standard deviation has not been reduced? Explain.

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